A new technology for fabrication of silica on silicon arrayed waveguide grating (AWG) based on deep etching and thermal oxidation is presented.Using this method,a silicon layer is remained at the side of waveguide.The stress distribution and effective refractive index of waveguide fabricated by this approach are calculated using finite element and finite difference beam propagation method,respectively.The results of these studies indicate that the stress of silica on silicon optical waveguide can be matched in parallel and vertical direction and AWG polarization dependent wavelength (PDλ) can be reduced effectively due to side-silicon layer.
Triplexers are designed based on SOl flattop arrayed waveguide gratings （AWGs）. Three wavelengths （1310, 1490,and 1550nm） operate at three diffraction orders of AWGs. Simulation shows that the 3dB bandwidth,crosstalk, and loss are 6nm,less than -40dB, and 5dB, respectively. The output optical fields of the device fabricated in our laboratory are clear and show a good triplexing function.
