The influence of atomic layer deposition parameters on the negative charge density in AlOx film is investigated by the corona-charge measurement. Results show that the charge density can reach up to -1.56×10^12 cm%-2 when the thickness of the film is 2.4 nm. The influence of charge density on cell conversion efficiency is further simulated using solar cell analyzing software （PC1D）. With AlOx passivating the rear surface of the silicon, the cell efficiency of 20.66% can be obtained.
Honeycomb structure is extraordinarily effective to trap light,and the efficiency of solar cell with this texture is as high as 24.4%.In this paper,plasma immersion ion implantation and acid etching are applied to texture multi-crystalline silicon.Surface reflectivity and surface morphology are investigated by UV–Vis–NIR spectrophotometer and field emission scanning electron microscopy,respectively.We found that random nano-honeycomb structures have been formed on silicon surface.The weighted average reflectance is 7.68%from 300 to 1,100 nm wavelength region.We obtained honeycomb-textured solar cells following standard fabrication protocol.These solar cells show obvious better performance in short circuit current density([5.4%)and efficiency(*0.8%absolute)compared with acid-textured cell,while other performance parameters,such as open circuit voltage and fill factor,are not deteriorated.
Jie LiuBangwu LiuSihua ZhongJinhu LiuYang XiaChaobo Li
Chemical and field-effect passivation of atomic layer deposition （ALD） Al2O3 films are investigated, mainly by corona charging measurement. The interface structure and material properties are characterized by transmission electron microscopy （TEM） and X-ray photoelectron spectroscopy （XPS）, respectively. Passivation performance is improved remarkably by annealing at temperatures of 450 ℃ and 500 ℃, while the improvement is quite weak at 600 ℃, which can be attributed to the poor quality of chemical passivation. An increase of fixed negative charge density in the films during annealing can be explained by the Al2O3/Si interface structural change. The Al–OH groups play an important role in chemical passivation, and the Al–OH concentration in an as-deposited film subsequently determines the passivation quality of that film when it is annealed, to a certain degree.
