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国家高技术研究发展计划(2006AA03A111)

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蓝宝石衬底上AlN的MOCVD外延生长
研究了通过金属有机化学气相沉积(MOCVD)技术生长的AIN外延层。通过改变生长室压强,发现降低压强对提高AIN外延效率有显著的效果,因而采用了50torr的低压生长。通过对蓝宝石衬底的不同时间的氮化研究,发现7分钟的氮...
闫建昌王军喜丛培沛刘乃鑫刘喆李晋闽
关键词:氮化HRXRD
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High quality AlGaN grown on a high temperature AlN template by MOCVD被引量:1
2009年
A high temperature AlN template was grown on sapphire substrate by metalorganic chemical vapor deposition.AFM results showed that the root mean square of the surface roughness was just 0.11 nm.Optical transmission spectrum and high resolution X-ray diffraction(XRD)characterization both proved the high quality of the AlN template.The XRD(002)rocking curve full width at half maximum(FWHM)was about 53.7 arcsec and(102)FWHM was about 625 arcsec.The densities of screw threading dislocations(TDs)and edge TDs wereestimated to be - 6 × 10^6 cm^-2 and - 4.7 ×10^9 cm^-2. AlGaN of Al composition 80.2% was further grown on the AlN template. The RMS of the surface roughness was about 0.51 nm. XRD reciprocal space mapping was carried out to accurately determine the Al composition and relaxation status in the AlGaN epilayer. The XRD (002) rocking curve FWHM of the AIGaN epilayer was about 140 arcsec and (102) FWHM was about 537 arcsec. The density of screw TDs was estimated to be - 4 × 10^7 cm^-2 and that of edge TDs was - 3.3 × 10^9 cm^-2. These values all prove the high quality of the AlN template and AlGaN epilayer.
闫建昌王军喜刘乃鑫刘喆阮军李晋闽
关键词:ALGANMOCVDXRD
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