系统研究两种不同形态的硅氧合金薄膜,用甚高频PECVD系统制备的非晶硅氧和纳米硅氧薄膜的特性,以及其在纳米硅薄膜叠层薄膜太阳电池中的应用。实验中主要通过对不同的气体流量比的优化、沉积功率和沉积压力的优化,分别制备出光学带隙约为2.1 e V,折射率约为3的a-SiO_x∶B∶H薄膜,作为非晶硅顶电池的p1层,以及带隙为2.2~2.5 e V,折射率为2.0~2.5,晶化率为20%~50%的nc-SiO_x∶P∶H薄膜,作为非晶硅/纳米硅叠层电池的中间反射层和纳米硅的底电池n2层。最后将优化后的a-SiO_x∶B∶H和nc-SiO_x∶P∶H薄膜应用到非晶硅/纳米硅薄膜叠层电池中,在0.79 m^2的玻璃基板上制备出初始峰值功率为101.1 W、全面积初始转换效率为12.8%、稳定峰值功率为87.3 W、全面积稳定转换效率为11.1%的非晶硅/纳米硅叠层电池。
为低成本提高硼硅酸盐玻璃光学和润湿性能,采用化学刻蚀法在玻璃表面制备具有减反和自清洁性能的薄层.利用NaOH溶液对预处理后的玻璃进行化学刻蚀,采用扫描电镜(scanning electron microscopy,SEM)对刻蚀前后玻璃表面形貌进行了观察,通过调控刻蚀液浓度,分别采用分光光度计和接触角仪测量玻璃表面的透光率和接触角随浓度的变化趋势.结果表明:经0.05 mol/L的氢氧化钠溶液刻蚀后,在表面形成长约为100 nm、宽约为10nm、分布比较均匀的细微沟槽,玻璃的透过率达94.85%,比原始基片提高了4.15%,接触角从53.13°降至3.25°,玻璃的光学性能和自清洁性能得到了有效的提高.
It is an important way to improve the efficiency of solar cells by using the special microstructures of surface.In this work,a pyramid-silicon nanowires (pyramidSiNWs) binary structure was prepared on the silicon surfaces with the metal-assisted chemical etching (MACE) method.Scanning electron microscope (SEM) was used to observe the micromorphology of the pyramid-SiNWs binary structure.The formation mechanism of the binary structure was discussed.The role of Ag nanoparticles in MACE is considered to be the template and the catalyzer.The optical reflectivity of the silicon surfaces was studied with ultraviolet-visible (UV-Vis) spectrophotometer.Compared with the fiat silicon surface and the simple pyramidal structure,the silicon surfaces with the pyramid-SiNWs binary structure achieve a much lower reflectance in a wide range of wavelength.The effect of etching time as a parameter on the reflectivity was also discussed.
Zi-Long ZhangBo WangYu ChenYun-Hui TangXue-Mei SongQing-Liu LiHui Yan
