In this paper,we present the applications of Boundary Element Method(BEM) to simulate the electro-mechanical coupling responses of Micro-Electro-Mechanical systems(MEMS). The algorithm is programmed in our research group based on BEM modeling for electrostatics and elastostatics.Good agreement is shown while the simulation results of the pull-in voltages are compared with the theoretical/experimental ones for some examples.
A piezoresistive silicon accelerometer fabricated by a selective,self-stopping porous silicon (PS) etching method using an epitaxial layer for movable microstructures is described and analyzed.The technique is capable of constructing a microstructure precisely.PS is used as a sacrificial layer,and releasing holes are etched in the film.TMAH solution with additional Si powder and (NH_4)_2S_2O_8 is used to remove PS through the small releasing holes without eroding uncovered Al.The designed fabrication process is full compatible with standard CMOS process.
