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国家自然科学基金(51271123)

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基于有限元模拟室温下等通道转角挤压纯钛工件的设计(英文)被引量:1
2015年
为了优化室温下等通道转角挤压纯钛工件的几何形状,采用三维有限元软件模拟了纯钛工件的变形行为。通过对比分析工件形状和尺寸对损伤因子、挤压力以及剪切带处应变速率分布等参数的影响,获得了工件最佳几何形状。仿真结果表明,方条形工件的损伤因子大于圆棒型工件,且高于纯钛材料的临界损伤因子,表明方条形工件不利于变形,易产生表面裂纹。3D模拟结果表明,直径为15mm的圆棒型工件具有最小的损伤因子,适中的挤压载荷以及相对均匀的应变分布。依据仿真结果提供的最佳工件,即直径为15 mm的圆棒型工件,室温下成功挤压出直径15 mm的纯钛圆棒。挤压后样品截面上硬度分布均匀,与3D仿真所预示的均匀应变分布相一致。
王晓梅王晓梅韩其琛陈爱英陈爱英李翔刘芳
关键词:有限元法等通道转角挤压
Strain Hardening of a Layered and Nanostructured AISI 304 Stainless Steel被引量:1
2014年
In order to improve the low ductility of nanostructured materials, a layered and nanostructured (LN) 304 SS (stainless steel) is prepared from warm co-rolled 304 SS pre-treated by surface mechanical attrition treatment. The microstructure and mechanical properties, as well as strain hardening, are analyzed in details. The LN steels ex- hibit both high strength and large ductility resulting from good strain hardening behaviors. The strain hardening can be subdivided into two stages, which involves a multiple cracking along interlaminar at the first stage and a strain-in- duced martensite (SIM) transformation at the second stage. The SIM transformation of nanocrystallines and ultrafine grains induces a larger work hardening exponent by the formation of nanoscaled martensite phase. The effect of grain size on the transformation dynamics is discussed.
Yan-quan JIAYong-li LIANGAi-ying CHENDeng PAN
Effect of bias voltage on microstructure and nanomechanical properties of Ti films被引量:5
2014年
In order to investigate nanomechanical properties of nanostructured Ti metallic material, pure Ti films were prepared by magnetron sputtering at the bias voltage of 0-140 V. The microstructure of Ti films was characterized by X-ray diffraction(XRD), scanning electron microscopy(SEM) and high-resolution transmission electron microscopy(HRTEM). It is interesting to find that the microstructure of pure Ti films was characterized by the composite structure of amorphous-like matrix embodied with nanocrystallines, and the crystallization was improved with the increase of bias voltage. The hardness of Ti films measured by nanoindentation tests shows a linear relationship with grain sizes in the scale of 6-15 nm. However, the pure Ti films exhibit a soft tendency characterized by a smaller slope of Hall-Petch relationship. In addition, the effect of bias voltage on the growth orientation of Ti films was discussed.
刘颍龙刘芳吴倩陈爱英李翔潘登
关键词:NANOCRYSTALLINE
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