The submicron chromium dioxide（CrO2） thin film was fabricated on a poly-crystal titania（TiO2） film using Si wafers as substrates by atmospheric pressure chemical vapor deposition（CVD） method. X-Ray diffraction patterns show that the CrO2 films were pure rutile structure. Scanning electron microscopy（SEM） images indicate that the CrO2 films consisted of submicron grains with a grain size of 250--750 rim. The magnetic researches reveal that the magnetic easy axis is parallel to the films, and at room temperature, the CrO2 films show linear magnetoresistance.
